Cite
HARVARD Citation
McFeely, C. et al. (2022). Rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers. Journal of materials chemistry. 10 (19), pp. 7476-7484. [Online].
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McFeely, C. et al. (2022). Rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers. Journal of materials chemistry. 10 (19), pp. 7476-7484. [Online].