Process-induced warpage and stress estimation of through glass via embedded interposer carrier with ring-type framework. (February 2022)
- Record Type:
- Journal Article
- Title:
- Process-induced warpage and stress estimation of through glass via embedded interposer carrier with ring-type framework. (February 2022)
- Main Title:
- Process-induced warpage and stress estimation of through glass via embedded interposer carrier with ring-type framework
- Authors:
- Huang, Pei-Chen
Lin, Yu-Min
Liu, Hsing-Ning
Lee, Chang-Chun - Abstract:
- Abstract: The feasibility of embedded interposer carrier (EIC) has been proposed and developed to improve the assembly process of three-dimensional (3D) integrated circuits (3D-ICs). However, the warpage and thermo-mechanical stress generated from the lamination process have been regarded as one of the critical issues in the mechanical reliability of 3D-ICs. A ring-type framework design was utilized in this study to conquer the warpage issue and improve the flatness of EIC, and its benefit was investigated by experimental measurement and process-oriented finite element simulation. Analytic results revealed that the warpage along diagonal and cross-sectional directions could be significantly restrained from 886 μm to 169 μm and from 484 μm to 84.6 μm, respectively. The maximum von Mises stress of Cu interconnect was observed to be 138 MPa simultaneously, and it did not generate plasticity after the lamination process. Consequently, the benefit of ring-type framework on the mechanical reliability of EIC architecture was investigated and discussed systemically. Graphical abstract: Unlabelled Image Highlights: Experimental measurement and process-oriented simulation were performed to investigate the EIC with metal ring. The warpage along the diagonal direction of EIC structure could be restrained by steel stiffener ring. Low-temperature lamination process integrated with stiffener ring improves warpage without sacrificing Cu trace reliability.
- Is Part Of:
- Microelectronics and reliability. Volume 129(2022)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 129(2022)
- Issue Display:
- Volume 129, Issue 2022 (2022)
- Year:
- 2022
- Volume:
- 129
- Issue:
- 2022
- Issue Sort Value:
- 2022-0129-2022-0000
- Page Start:
- Page End:
- Publication Date:
- 2022-02
- Subjects:
- Embedded interposer carrier -- Lamination -- Warpage -- Stress -- Finite element analysis
Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2021.114476 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 20686.xml