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APA Citation

    Pan, K., Xu, J., Lai, Y., Park, S., Okoro, C., Joshi, D., & Pollard, S. (2022). in-situ temperature-dependent characterization of copper through glass via (TGV). Microelectronics and reliability, 129, . http://access.bl.uk/ark:/81055/vdc_100150528642.0x000053
  
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