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APA Citation
Qiu, J., Hu, G., Wang, Y., Wang, Y., Luo, M., & Hu, X. (2022). a high refractive index resist for UV-nanoimprint soft lithography based on titanium-containing elemental polymer oligomers. Journal of materials chemistry, 10(1), 219–226. http://access.bl.uk/ark:/81055/vdc_100148073575.0x000015