Cite
HARVARD Citation
Qiu, J. et al. (2022). A high refractive index resist for UV-nanoimprint soft lithography based on titanium-containing elemental polymer oligomers. Journal of materials chemistry. 10 (1), pp. 219-226. [Online].
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Qiu, J. et al. (2022). A high refractive index resist for UV-nanoimprint soft lithography based on titanium-containing elemental polymer oligomers. Journal of materials chemistry. 10 (1), pp. 219-226. [Online].