Cite
HARVARD Citation
Rue, C. et al. (n.d.). Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications. Microscopy and microanalysis. pp. 860-861. [Online].
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Rue, C. et al. (n.d.). Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications. Microscopy and microanalysis. pp. 860-861. [Online].