Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications. (August 2019)

Record Type:: Journal Article
Title:: Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications. (August 2019)
Main Title:: Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications
Authors:: Rue, Chad
Wang, Jing
Randolph, Steven
Mitchson, Gavin
Abstract:
Is Part Of:: Microscopy and microanalysis. Volume 25:(2022)Supplement 2
Journal:: Microscopy and microanalysis
Issue:: Volume 25:(2022)Supplement 2
Issue Display:: Volume 25, Issue 2 (2019)
Year:: 2019
Volume:: 25
Issue:: 2
Issue Sort Value:: 2019-0025-0002-0000
Page Start:: 860
Page End:: 861
Publication Date:: 2019-08
Subjects:: Microscopy -- Periodicals
Microchemistry -- Periodicals
502.82
Journal URLs:: https://academic.oup.com/mam ↗
http://journals.cambridge.org/action/displayJournal?jid=MAM ↗
http://link.springer.de/link/service/journals/10005/index.htm ↗
http://firstsearch.oclc.org ↗
DOI:: 10.1017/S1431927619005038 ↗
Languages:: English
ISSNs:: 1431-9276
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library HMNTS - ELD Digital store
Ingest File:: 20072.xml