A GaN-on-Si quasi-vertical Schottky barrier diode with enhanced performance using fluorine ion-implanted field rings. (29th October 2021)

• Record Type: Journal Article
• Authors: Chen, Jiabo; Song, Xiufeng; Liu, Zhihong; Duan, Xiaoling; Wang, Haiyong; Bian, Zhaoke; Zhao, Shenglei; Zhang, Jincheng; Hao, Yue
• Is Part Of: Applied physics express. Volume 14:Number 11(2021)
• Publication Date: 2021-10-29
• Subjects: GaN -- quasi-vertical -- SBD -- fluorine ion implantation -- field ring; Physics -- Periodicals; Technology -- Periodicals; 621.05
• DOI: 10.35848/1882-0786/ac2e9c
• Languages: English
• ISSNs: 1882-0778

Abstract

Abstract: A GaN-on-Si quasi-vertical Schottky barrier diode (SBD) was fabricated with its performance enhanced using fluorine-implanted field rings and sidewall cathodes. F ions induced negative charges and the sidewall electrodes enhanced both the SBD's breakdown and the on-resistance performance. A low specific on-resistance of 1.23 mΩ·cm 2, a turn-on voltage of 0.54 V, a near unity ideality factor of 1.04, a high on/off ratio of >10 9, and a high breakdown voltage ( BV ) of 483 V are achieved with a GaN-on-Si quasi-vertical SBD with a 4.5 μ m drift layer. The temperature dependency of the I–V characteristics proves the thermal stability of the proposed SBD.