Cite
APA Citation
Henning, A., Bartl, J. D., Zeidler, A., Qian, S., Bienek, O., Jiang, C., Paulus, C., Rieger, B., Stutzmann, M., & Sharp, I. D. (2021). aluminum Oxide at the Monolayer Limit via Oxidant‐Free Plasma‐Assisted Atomic Layer Deposition on GaN. Advanced functional materials, 31, n/a. http://access.bl.uk/ark:/81055/vdc_100140197709.0x000016