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HARVARD Citation
Go, D. et al. (2021). Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization. Ceramics international. 47 (20), pp. 28770-28777. [Online].
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Go, D. et al. (2021). Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization. Ceramics international. 47 (20), pp. 28770-28777. [Online].