Disclosing AlN ceramic substrate process failure mode and effect analysis. (December 2019)
- Record Type:
- Journal Article
- Title:
- Disclosing AlN ceramic substrate process failure mode and effect analysis. (December 2019)
- Main Title:
- Disclosing AlN ceramic substrate process failure mode and effect analysis
- Authors:
- Hung, Shiu-Wan
Chen, Ting-Ko - Abstract:
- Abstract: Due to the excellent thermal conductivity and physical and chemical characteristics of aluminium nitride (AlN) ceramic substrate, it can be useful for electronic applications. Furthermore, it is an ideal substrate material for the future. In this paper, we analyze and compare the traditional process of AlN ceramic substrate preparation methods (thin-film, thick-film, and direct bonded copper methods). The thin-film method requires precision instruments such as sputtering machines, but the equipment is expensive and the manufacturing cost is high. The direct bonded copper method requires a high temperature (approximately 1070 °C) to sinter the copper film onto the surface of the ceramic substrate. After this is finished, the conductive film must undergo some complicated process to obtain the products for both processes. Although the thick-film method is the easiest to undertake, it is limited in its process capability and cannot meet the development needs of the electronics industry in the future. Accordingly, this paper presents an investigation of the laser plated copper method to establish its advantages and disadvantages. This study compares traditional AlN metallisation with the laser radiation plated copper method, and discusses the application of three different methods, as follows: the selective chemical copper, selective electroless nickel, and electroless gold methods. These applications could achieve process simplification, precision design, easyAbstract: Due to the excellent thermal conductivity and physical and chemical characteristics of aluminium nitride (AlN) ceramic substrate, it can be useful for electronic applications. Furthermore, it is an ideal substrate material for the future. In this paper, we analyze and compare the traditional process of AlN ceramic substrate preparation methods (thin-film, thick-film, and direct bonded copper methods). The thin-film method requires precision instruments such as sputtering machines, but the equipment is expensive and the manufacturing cost is high. The direct bonded copper method requires a high temperature (approximately 1070 °C) to sinter the copper film onto the surface of the ceramic substrate. After this is finished, the conductive film must undergo some complicated process to obtain the products for both processes. Although the thick-film method is the easiest to undertake, it is limited in its process capability and cannot meet the development needs of the electronics industry in the future. Accordingly, this paper presents an investigation of the laser plated copper method to establish its advantages and disadvantages. This study compares traditional AlN metallisation with the laser radiation plated copper method, and discusses the application of three different methods, as follows: the selective chemical copper, selective electroless nickel, and electroless gold methods. These applications could achieve process simplification, precision design, easy production of three-dimensional extrusions, and green production processes. This research establishes and designs AlN metallisation using the failure mode and effect analysis (FMEA) model, by analysing possible causes and solutions in advance. The information herein obtained can be used as the reference for laser-enhanced AlN metallisation, to avoid potential problems and product damage during mass production. Highlights: AlN due to its excellent characteristics is an ideal substrate materials. We analyze the traditional process of AlN ceramic substrate preparation methods. LPC method of AlN could achieve process simplification, precision design 3d extrude. Using the FMEA model analysed the possible cause and solution in advance. … (more)
- Is Part Of:
- Microelectronics and reliability. Volume 103(2019)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 103(2019)
- Issue Display:
- Volume 103, Issue 2019 (2019)
- Year:
- 2019
- Volume:
- 103
- Issue:
- 2019
- Issue Sort Value:
- 2019-0103-2019-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-12
- Subjects:
- Aluminium nitride -- Ceramic substrate -- Laser plated copper -- Direct bonded copper -- Electroless nickel -- Electroless gold -- Failure mode and effect analysis
Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2019.113508 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 18560.xml