Performance analysis of 4H-SiC super-junction devices: impact of trench angle and improvement with multi-epi structure. (31st August 2021)
- Record Type:
- Journal Article
- Title:
- Performance analysis of 4H-SiC super-junction devices: impact of trench angle and improvement with multi-epi structure. (31st August 2021)
- Main Title:
- Performance analysis of 4H-SiC super-junction devices: impact of trench angle and improvement with multi-epi structure
- Authors:
- Wang, Baozhu
Wang, Hengyu
Wang, Ce
Cheng, Haoyuan
Ren, Na
Guo, Qing
Sheng, Kuang - Abstract:
- Abstract: This paper studies the impact of the trench angle on SiC super-junction device performance through the numerical simulation. Devices with different structure parameter sets (mesa width, epi doping) targeting different voltage ratings have been considered. It is found that with the optimum epi doping, the highest Baliga's figure of merit (BFOM) is always achieved at the trench angle of 90°. The advantage of 90° trench angle can be further increased by reducing the mesa width (MW). However, the 90° trench is hard to be achieved through the current fabrication technology. Once the trench angle is reduced slightly, the device BFOM will decrease evidently especially for high voltage devices. At this condition, the reduction of mesa width does not necessarily produce higher BFOM. For example, at the trench angle of 89° and trench depth of 25 μ m, the BFOM of the device with MW = 3 μ m is substantially higher than that of the device with MW = 1 μ m. Such a phenomenon is contrary to conventional theory, which is crucial for device design. Finally, in order to improve the performance of devices with non-90° trenches, the multi-epi structure is proposed. With such a novel structure, significant improvements have been observed in the simulation. The BFOM increments for 2 kV, 3.5 kV and 5 kV voltage rating devices are 27.4%, 60.8% and 102.6% respectively, demonstrating the superiority of the proposed multi-epi structure for SiC super-junction devices.
- Is Part Of:
- Semiconductor science and technology. Volume 36:Number 10(2021)
- Journal:
- Semiconductor science and technology
- Issue:
- Volume 36:Number 10(2021)
- Issue Display:
- Volume 36, Issue 10 (2021)
- Year:
- 2021
- Volume:
- 36
- Issue:
- 10
- Issue Sort Value:
- 2021-0036-0010-0000
- Page Start:
- Page End:
- Publication Date:
- 2021-08-31
- Subjects:
- silicon carbide (SiC) -- super-junction -- trench angle -- multi-epi
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/0268-1242/1 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6641/ac1c9f ↗
- Languages:
- English
- ISSNs:
- 0268-1242
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 19039.xml