Influence of radio frequency magnetron sputtering parameters on the structure and performance of SiC films. Issue 17 (1st September 2021)

• Record Type: Journal Article
• Authors: Liu, Meng; Yang, Yong; Mao, Quan; Wei, Yuquan; Li, Yajie; Ma, Ningning; Liu, Huan; Liu, Xuejian; Huang, Zhengren
• Is Part Of: Ceramics international. Volume 47:Issue 17(2021)
• Page Start: 24098
• Page End: 24105
• Publication Date: 2021-09-01
• Subjects: SiC films -- RF magnetron Sputtering -- Larger target-substrate distance -- High elasticity modulus and hardness; Ceramics -- Periodicals; Céramique industrielle -- Périodiques; Ceramics; Periodicals; Electronic journals; 666
• DOI: 10.1016/j.ceramint.2021.05.120
• Languages: English
• ISSNs: 0272-8842

Abstract

Abstract: Amorphous SiC films fabricated by Radio frequency (RF) magnetron sputtering have been widely used due to their excellent properties including high strength, good hardness and outstanding abrasion resistance. However, most researches set a lower target-substrate distance, which limits its large-scale coating for practical industrial application. In this work, the distance between the target and substrate was enlarged to 120 mm, and the effective coating area was about four to ten times than other researches. Furthermore, the effects of sputtering power, deposition pressure, substrate temperature and bias voltage on the structure and performance of SiC films were also investigated. Finally, SiC films with high elasticity modulus (310.8 GPa) and hardness (35.6 GPa) are obtained by RF magnetron sputtering.