300°C operation of normally‐off AlGaN/GaN MOSFET with low leakage current and high on/off current ratio. Issue 4 (1st February 2014)
- Record Type:
- Journal Article
- Title:
- 300°C operation of normally‐off AlGaN/GaN MOSFET with low leakage current and high on/off current ratio. Issue 4 (1st February 2014)
- Main Title:
- 300°C operation of normally‐off AlGaN/GaN MOSFET with low leakage current and high on/off current ratio
- Authors:
- Xu, Zhe
Wang, Jinyan
Cai, Yong
Liu, Jingqian
Yang, Zhen
Li, Xiaoping
Wang, Maojun
Yang, Zhenchuang
Xie, Bin
Yu, Min
Wu, Wengang
Ma, Xiaohua
Zhang, Jincheng
Hao, Yue - Abstract:
- Abstract : 300°C operation of a normally‐off AlGaN/GaN metal‐oxide semiconductor field‐effect transistor (MOSFET) is successfully demonstrated, which is fabricated using a self‐terminating gate recess etching technique. At 300°C, by employing a 15 nm‐thick Al2 O3 as the gate dielectric deposited by atomic layer deposition, the fabricated normally‐off MOSFET exhibits a threshold voltage ( V th ) of 3.2 V, a low off‐state leakage current of ∼10 −7 A/mm and a low forward gate leakage current of ∼10 −7 A/mm. Thus, a high on/off current ratio of ∼ 10 6 is obtained. Furthermore, the normally‐off MOSFET also exhibits small variations in terms of its V th from room temperature to 300°C with a maximum relative variation of 6.7% in a such temperature range. These results make this normally‐off AlGaN/GaN MOSFET very promising for high‐temperature digital electronics.
- Is Part Of:
- Electronics letters. Volume 50:Issue 4(2014)
- Journal:
- Electronics letters
- Issue:
- Volume 50:Issue 4(2014)
- Issue Display:
- Volume 50, Issue 4 (2014)
- Year:
- 2014
- Volume:
- 50
- Issue:
- 4
- Issue Sort Value:
- 2014-0050-0004-0000
- Page Start:
- 315
- Page End:
- 316
- Publication Date:
- 2014-02-01
- Subjects:
- aluminium compounds -- atomic layer deposition -- etching -- gallium compounds -- III‐V semiconductors -- leakage currents -- MOSFET -- wide band gap semiconductors
normally‐off MOSFET -- high on‐off current ratio -- metal‐oxide semiconductor field‐effect transistor -- self‐terminating gate recess etching technique -- gate dielectric deposition -- atomic layer deposition -- low off‐state leakage current ratio -- low forward gate leakage current ratio -- high‐temperature digital electronics -- temperature 300 degC -- size 15 nm -- voltage 3.2 V -- temperature 293 K to 298 K -- AlGaN‐GaN
Electronics -- Periodicals
621.381 - Journal URLs:
- http://digital-library.theiet.org/content/journals/el ↗
http://estar.bl.uk/cgi-bin/sciserv.pl?collection=journals&journal=00135194 ↗
https://ietresearch.onlinelibrary.wiley.com/loi/1350911x ↗
http://www.theiet.org/ ↗ - DOI:
- 10.1049/el.2013.3928 ↗
- Languages:
- English
- ISSNs:
- 0013-5194
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3705.060000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 17373.xml