InN crystal habit, structural, electrical, and optical properties affected by sapphire substrate nitridation in N-polar InN/InAlN heterostructures. (23rd June 2021)
- Record Type:
- Journal Article
- Title:
- InN crystal habit, structural, electrical, and optical properties affected by sapphire substrate nitridation in N-polar InN/InAlN heterostructures. (23rd June 2021)
- Main Title:
- InN crystal habit, structural, electrical, and optical properties affected by sapphire substrate nitridation in N-polar InN/InAlN heterostructures
- Authors:
- Gucmann, Filip
Kučera, Michal
Hasenöhrl, Stanislav
Eliáš, Peter
Rosová, Alica
Dobročka, Edmund
Stoklas, Roman
Kuzmík, Ján - Abstract:
- Abstract: Indium nitride (InN) is a very promising direct bandgap semiconductor material for near-infrared optoelectronic devices and high speed transistors, however InN growth is much more challenging compared to other III-N semiconductors. In this study we analysed the impact of pre-growth vicinal c -plane sapphire substrate nitridation on the electrical, optical, and strucutral properties of N-polar InN/InAlN heterostructures and the InN crystal habit. While a short cool-down nitridation phase resulted in a high quality InAlN layer and low quality InN layer, it was the opposite for a long cool-down nitridation phase. A trade-off between the electrical and optical properties was observed: the short nitridation cool-down produced InN layers with a higher electron mobility of 629 cm 2 V −1 s −1 and low photoluminescence (PL) emission, and the long one resulted in InN with a ∼21% lower electron mobility of 497 cm 2 V −1 s −1 but strong PL emission. Also, a very different InN crystal habit was observed for either case. The short nitridation cool-down was conducive to the formation of a continuous layer consisting mostly of coalesced downward-pointing hexagonal pyramids, while the long one led to a layer of upward-pointing hexagonal pyramids. The local decomposition of an AlON layer produced by sapphire nitridation and variations in the InAlN surface morphology resulting in a preferential attraction of growth species and localised change in the surface free energy contributionsAbstract: Indium nitride (InN) is a very promising direct bandgap semiconductor material for near-infrared optoelectronic devices and high speed transistors, however InN growth is much more challenging compared to other III-N semiconductors. In this study we analysed the impact of pre-growth vicinal c -plane sapphire substrate nitridation on the electrical, optical, and strucutral properties of N-polar InN/InAlN heterostructures and the InN crystal habit. While a short cool-down nitridation phase resulted in a high quality InAlN layer and low quality InN layer, it was the opposite for a long cool-down nitridation phase. A trade-off between the electrical and optical properties was observed: the short nitridation cool-down produced InN layers with a higher electron mobility of 629 cm 2 V −1 s −1 and low photoluminescence (PL) emission, and the long one resulted in InN with a ∼21% lower electron mobility of 497 cm 2 V −1 s −1 but strong PL emission. Also, a very different InN crystal habit was observed for either case. The short nitridation cool-down was conducive to the formation of a continuous layer consisting mostly of coalesced downward-pointing hexagonal pyramids, while the long one led to a layer of upward-pointing hexagonal pyramids. The local decomposition of an AlON layer produced by sapphire nitridation and variations in the InAlN surface morphology resulting in a preferential attraction of growth species and localised change in the surface free energy contributions were most likely responsible for these observations. Our results also suggest N-polar buffer layers are likely to produce coalesced InN layers with a high electron mobility, while metal-polar buffer layers may facilitate the growth of high crystal quality pyramidal InN with a strong optical response. … (more)
- Is Part Of:
- Semiconductor science and technology. Volume 36:Number 7(2021)
- Journal:
- Semiconductor science and technology
- Issue:
- Volume 36:Number 7(2021)
- Issue Display:
- Volume 36, Issue 7 (2021)
- Year:
- 2021
- Volume:
- 36
- Issue:
- 7
- Issue Sort Value:
- 2021-0036-0007-0000
- Page Start:
- Page End:
- Publication Date:
- 2021-06-23
- Subjects:
- MOCVD -- InN -- InAlN -- nitridation -- vicinal substrate -- off-axis substrate
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/0268-1242/1 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6641/ac06e4 ↗
- Languages:
- English
- ISSNs:
- 0268-1242
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 17345.xml