How topographical surface parameters are correlated with CdTe monocrystal surface oxidation. (October 2018)

• Record Type: Journal Article
• Authors: Ţălu, Ştefan; Yadav, Ram Pratap; Šik, Ondřej; Sobola, Dinara; Dallaev, Rashid; Solaymani, Shahram; Man, Ondřej
• Is Part Of: Materials science in semiconductor processing. Volume 85(2018)
• Page Start: 15
• Page End: 23
• Publication Date: 2018-10
• Subjects: CdTe monocrystals -- Atomic force microscopy -- Fractal analysis -- Surface oxidation -- Surface morphology; Semiconductors -- Periodicals; Integrated circuits -- Materials -- Periodicals; Semiconducteurs -- Périodiques; Circuits intégrés -- Matériaux -- Périodiques; Electronic journals; 621.38152
• DOI: 10.1016/j.mssp.2018.05.030
• Languages: English
• ISSNs: 1369-8001

Abstract

Abstract: Numerical analysis was applied to three-dimensional (3D) images for a quantitative description of evolution of surface topography of CdTe after oxidation. The results of fractal analysis show the correlation of fractal dimension and statistical characteristics of surface topography. Surface texture analysis provides dependence of topography characteristics on oxidation process. The comprehensive description of the surface micromorphology of the CdTe is an important challenge and it is essential for understanding their properties and their potential technological exploitation. The changes in surface topography were evaluated by atomic force microscopy (AFM). This characterization was carried out for the quantitative analysis of specific microstructural characteristics of samples.