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APA Citation
Lawrowski, R. D., Prommesberger, C., Langer, C., Dams, F., & Schreiner, R. (2014). improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching. Advances in materials science and engineering, 2014, . http://access.bl.uk/ark:/81055/vdc_100082260823.0x000031