Cite
MLA Citation
H. Hussin et al.. “Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs.” TheScientificWorldjournal, vol. 2014, 2014, p. . http://access.bl.uk/ark:/81055/vdc_100131060456.0x00002b