10 A/567 V normally off p‐GaN gate HEMT with high‐threshold voltage and low‐gate leakage current. Issue 13 (1st June 2018)
- Record Type:
- Journal Article
- Title:
- 10 A/567 V normally off p‐GaN gate HEMT with high‐threshold voltage and low‐gate leakage current. Issue 13 (1st June 2018)
- Main Title:
- 10 A/567 V normally off p‐GaN gate HEMT with high‐threshold voltage and low‐gate leakage current
- Authors:
- Hao, Ronghui
Wu, Dongdong
Fu, Kai
Song, Liang
Chen, Fu
Zhao, Jie
Du, Zhongkai
Zhang, Bingliang
Wang, Qilong
Yu, Guohao
Cheng, Kai
Cai, Yong
Zhang, Xinping
Zhang, Baoshun - Abstract:
- Abstract : Normally off p‐gallium nitride (GaN) gate high‐electron‐mobility transistors (HEMTs) on silicon substrate were fabricated with hydrogen plasma treatment technology, which features a high‐resistivity cap layer (HRCL) at the access region. With hydrogen plasma treatment at the access region, the normally off operation was obtained with a threshold voltage of +2.5 V based on the linear extrapolation of the transfer curve. The fabricated HRCL‐HEMT with a gate width of 49.7 mm exhibits a maximum drain current of 10 A at V GS = 8 V and a high off‐state breakdown voltage of 567 V at V GS = 0 V with substrate grounded. Meanwhile, the HRCL‐HEMT also shows low‐gate leakage current of 1.3 × 10 −7 and 3.3 × 10 −10 A/mm at V GS = 8 V and = −30 V, respectively. The positive threshold voltage, high drain current, high‐breakdown voltage and low‐gate leakage show the potential of HRCL‐HEMT for power switching applications.
- Is Part Of:
- Electronics letters. Volume 54:Issue 13(2018)
- Journal:
- Electronics letters
- Issue:
- Volume 54:Issue 13(2018)
- Issue Display:
- Volume 54, Issue 13 (2018)
- Year:
- 2018
- Volume:
- 54
- Issue:
- 13
- Issue Sort Value:
- 2018-0054-0013-0000
- Page Start:
- 848
- Page End:
- 849
- Publication Date:
- 2018-06-01
- Subjects:
- III‐V semiconductors -- wide band gap semiconductors -- semiconductor device breakdown -- silicon -- gallium compounds -- high electron mobility transistors -- leakage currents -- nanofabrication
high‐threshold voltage -- low‐gate leakage current -- p‐gallium nitride gate high‐electron‐mobility transistors -- silicon substrate -- hydrogen plasma treatment technology -- high‐resistivity cap layer -- fabricated HRCL‐HEMT -- off‐state breakdown voltage -- positive threshold voltage -- high‐breakdown voltage -- normally off p‐GaN gate HEMT -- power switching application -- current 10.0 A -- voltage 567.0 V -- voltage 2.5 V -- size 49.7 mm -- voltage 8.0 V -- voltage ‐30.0 V -- GaN -- Si
Electronics -- Periodicals
621.381 - Journal URLs:
- http://digital-library.theiet.org/content/journals/el ↗
http://estar.bl.uk/cgi-bin/sciserv.pl?collection=journals&journal=00135194 ↗
https://ietresearch.onlinelibrary.wiley.com/loi/1350911x ↗
http://www.theiet.org/ ↗ - DOI:
- 10.1049/el.2017.3981 ↗
- Languages:
- English
- ISSNs:
- 0013-5194
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3705.060000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 16442.xml