5.3A/400V normally‐off AlGaN/GaN‐on‐Si MOS‐HEMT with high threshold voltage and large gate swing. Issue 3 (1st January 2013)
- Record Type:
- Journal Article
- Title:
- 5.3A/400V normally‐off AlGaN/GaN‐on‐Si MOS‐HEMT with high threshold voltage and large gate swing. Issue 3 (1st January 2013)
- Main Title:
- 5.3A/400V normally‐off AlGaN/GaN‐on‐Si MOS‐HEMT with high threshold voltage and large gate swing
- Authors:
- Dong, Zhihua
Tan, Shuxin
Cai, Yong
Chen, Hongwei
Liu, Shenghou
Xu, Jicheng
Xue, Lu
Yu, Guohao
Wang, Yue
Zhao, Desheng
Hou, Keyu
Chen, Kevin J.
Zhang, Baoshun - Abstract:
- Abstract : Normally‐off AlGaN/GaN metal‐oxide‐semiconductor high electron mobility transistors (MOS‐HEMTs) on Si substrate were fabricated with the fluorine‐based treatment technique. By employing a 20nm‐thick Al2 O3 gate dielectric deposited by atomic layer deposition, the fabricated MOS‐HEMT exhibits a large positive threshold voltage of + 3.5V, a maximum gate input voltage of 15V, a maximum saturate drain current of 5.3A and an off‐state breakdown voltage of 402V. The high threshold voltage and the large input voltage swing is expected to improve the electromagnetic interference immunity and safety of AlGaN/GaN MOS‐HEMT power switches.
- Is Part Of:
- Electronics letters. Volume 49:Issue 3(2013)
- Journal:
- Electronics letters
- Issue:
- Volume 49:Issue 3(2013)
- Issue Display:
- Volume 49, Issue 3 (2013)
- Year:
- 2013
- Volume:
- 49
- Issue:
- 3
- Issue Sort Value:
- 2013-0049-0003-0000
- Page Start:
- 221
- Page End:
- 222
- Publication Date:
- 2013-01-01
- Subjects:
- AlGaN‐GaN -- Si -- Al2O3
current -- size -- voltage -- voltage -- voltage
alumina -- aluminium compounds -- atomic layer deposition -- dielectric materials -- electromagnetic interference -- elemental semiconductors -- field effect transistor switches -- gallium compounds -- high electron mobility transistors -- III‐V semiconductors -- MOSFET -- power semiconductor switches -- silicon -- wide band gap semiconductors
MOS‐HEMT -- high threshold voltage -- metal‐oxide‐semiconductor high electron mobility transistors -- fluorine‐based treatment technique -- gate dielectric -- atomic layer deposition -- large input voltage swing -- electromagnetic interference immunity -- MOS‐HEMT power switches -- current 5.3 A -- voltage 400 V -- size 20 nm -- voltage 3.5 V -- voltage 402 V -- AlGaN‐GaN -- Si -- Al2O3
Electronics -- Periodicals
621.381 - Journal URLs:
- http://digital-library.theiet.org/content/journals/el ↗
http://estar.bl.uk/cgi-bin/sciserv.pl?collection=journals&journal=00135194 ↗
https://ietresearch.onlinelibrary.wiley.com/loi/1350911x ↗
http://www.theiet.org/ ↗ - DOI:
- 10.1049/el.2012.3153 ↗
- Languages:
- English
- ISSNs:
- 0013-5194
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3705.060000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 16415.xml