Cite
APA Citation
Chu, C., Lin, Y., Lee, W., Dee, C. F., Wong, Y., Majlis, B. Y., Salleh, M. M., Yap, S. L., & Chang, E. Y. (n.d.). reliability study of high-κ La2O3/HfO2 and HfO2/La2O3 stacking layers on n-In0.53Ga0.47As metal–oxide–semiconductor capacitor. Applied physics express, 9, . http://access.bl.uk/ark:/81055/vdc_100125484365.0x000002