The preparation and investigation of all thin film electrochromic devices based on reactively sputtered MoO3 thin films. (May 2021)

• Record Type: Journal Article
• Authors: Han, Qiaonan; Wang, Rui; Zhu, Hongbing; Wan, Meixiu; Mai, Yaohua
• Is Part Of: Materials science in semiconductor processing. Volume 126(2021)
• Publication Date: 2021-05
• Subjects: MoO3 thin film -- Reactive magnetron sputtering -- Electrochromic device; Semiconductors -- Periodicals; Integrated circuits -- Materials -- Periodicals; Semiconducteurs -- Périodiques; Circuits intégrés -- Matériaux -- Périodiques; Electronic journals; 621.38152
• DOI: 10.1016/j.mssp.2021.105686
• Languages: English
• ISSNs: 1369-8001

Abstract

Abstract: Reactively sputtered molybdenum trioxide (MoO3 ) thin films were systematically investigated and employed as cathodic electrochromic layers in all thin film electrochromic devices (ATF-ECDs). The gas loop controller was employed for adjustment of inputted oxygen gas flux by monitoring the target voltage during reactive sputtering. The working pressure played a great role on the deposition rate, crystallite size, optical properties and the electrochromic properties of MoO3 and the applied ATF-ECDs (soda lime glass (SLG)/ITO/NiOX /Ta2 O5 /MoO3 /ITO). A 4 Pa MoO3 based ATF-ECD achieved a high optical modulation (transmission @ 600 nm) of ~50% and a high coloration efficiency of 149.4 cm 2 /C.