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APA Citation
Kojiri, T., Suwa, T., Hashimoto, K., Teramoto, A., Kuroda, R., & Sugawa, S. (2016). introduction of a High Selectivity Etching Process with Advanced SiNx Etch Gas in the Fabrication of FinFET Structures. ECS transactions, 72, 23–30. http://access.bl.uk/ark:/81055/vdc_100116177855.0x00000c