Cite
HARVARD Citation
Kojiri, T. et al. (2016). Introduction of a High Selectivity Etching Process with Advanced SiNx Etch Gas in the Fabrication of FinFET Structures. ECS transactions. pp. 23-30. [Online].
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Kojiri, T. et al. (2016). Introduction of a High Selectivity Etching Process with Advanced SiNx Etch Gas in the Fabrication of FinFET Structures. ECS transactions. pp. 23-30. [Online].