Effects of isothermal storage on grain structure of Cu/Sn/Cu microbump interconnects for 3D stacking. (November 2019)
- Record Type:
- Journal Article
- Title:
- Effects of isothermal storage on grain structure of Cu/Sn/Cu microbump interconnects for 3D stacking. (November 2019)
- Main Title:
- Effects of isothermal storage on grain structure of Cu/Sn/Cu microbump interconnects for 3D stacking
- Authors:
- Panchenko, Iuliana
Wolter, Klaus-Juergen
Croes, Kristof
De Wolf, Ingrid
De Messemaeker, Joke
Beyne, Eric
Wolf, M. Juergen - Abstract:
- Abstract: The crystal orientation and grain distribution of Cu6 Sn5 and Cu3 Sn intermetallic compounds (IMCs) in miniaturized solid-liquid interdiffusion (SLID) interconnects for 3D stacking were investigated. Therefore Cu/Sn microbumps with a diameter of 15 μm on top die (metal height 5.4 μm/3.6 μm) and Cu microbumps with a diameter of 25 μm on bottom die (metal height 9.5 μm) were used for bonding and subsequent thermal storage. The effect of the storage time (varied from 10 min to 96 h) and storage temperature (150, 240 and 260 °C) on the grain structure formation was investigated by Electron Backscatter Diffraction (EBSD). After the initial Cu6 Sn5 scallops have grown together, the corresponding Cu6 Sn5 layer only consists of one or two grains, which are orientated with 〈10−11〉 and 〈2−1−12〉 directions parallel to the IMC growth direction (perpendicular to substrate or Cu layer). The Cu3 Sn IMC showed small columnar grains in its early growth stage, which develop into grains with a polygonal shape due to coarsening effects. Cu3 Sn grains are orientated randomly at the early growth stage and tend to be orientated mostly with 〈10−10〉 and 〈2−1−10〉 parallel to the IMC growth direction at higher temperatures and longer storage times. Highlights: Grain structure of Cu/Sn interconnects with Ø15 μm was investigated. The influence of storage time and temperature on grain structure was investigated. Preferred grain orientations of Cu6 Sn5 and Cu3 Sn grains were found.
- Is Part Of:
- Microelectronics and reliability. Volume 102(2019)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 102(2019)
- Issue Display:
- Volume 102, Issue 2019 (2019)
- Year:
- 2019
- Volume:
- 102
- Issue:
- 2019
- Issue Sort Value:
- 2019-0102-2019-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-11
- Subjects:
- SLID -- Bonding -- Cu6Sn5 -- Cu3Sn -- EBSD -- Grain structure
Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2019.05.011 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 15511.xml