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APA Citation
Dabral, A., Pourtois, G., Sankaran, K., Magnus, W., Yu, H., de Jamblinne de Meux, A., Lu, A. K. A., Clima, S., Stokbro, K., Schaekers, M., Collaert, N., Horiguchi, N., & Houssa, M. (2018). study of the Intrinsic Limitations of the Contact Resistance of Metal/Semiconductor Interfaces through Atomistic Simulations. ECS journal of solid state science and technology, 7, N73–N80. http://access.bl.uk/ark:/81055/vdc_100117129507.0x000007