Cite
HARVARD Citation
Cha, S. et al. (2021). Characterization of non-stoichiometric Ga2O3-x thin films grown by radio-frequency powder sputtering. Ceramics international. 47 (3), pp. 3238-3243. [Online].
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Cha, S. et al. (2021). Characterization of non-stoichiometric Ga2O3-x thin films grown by radio-frequency powder sputtering. Ceramics international. 47 (3), pp. 3238-3243. [Online].