SO2 gas sensing characteristics of FET- and resistor-type gas sensors having WO3 as sensing material. (March 2020)
- Record Type:
- Journal Article
- Title:
- SO2 gas sensing characteristics of FET- and resistor-type gas sensors having WO3 as sensing material. (March 2020)
- Main Title:
- SO2 gas sensing characteristics of FET- and resistor-type gas sensors having WO3 as sensing material
- Authors:
- Jung, Gyuweon
Jeong, Yujeong
Hong, Yoonki
Wu, Meile
Hong, Seongbin
Shin, Wonjun
Park, Jinwoo
Jang, Dongkyu
Lee, Jong-Ho - Abstract:
- Highlights: SO2 sensing characteristics of the FET- and resistor-type sensors are investigated. 18-nm-thick WO3 film is used as a sensing layer. Applying a negative pre-bias to the FET-type gas sensor increases the response. Abstract: Sensing characteristics of the SO2 gas are investigated using a horizontal floating-gate FET-type gas sensor. SO2 gas sensing characteristics of the resistor-type gas sensor, a conventional sensor, fabricated on the same wafer are also investigated and compared with the FET-type gas sensor. The 18-nm-thick WO3 deposited using a radio frequency magnetron sputtering method is used as the sensing material. The SO2 gas sensing characteristics are examined while varying the operating temperature, the concentration of the SO2 gas, and the pre-bias ( V pre ). The sensing mechanism for detecting the SO2 gas in an FET-type gas sensor is examined. Both sensors are able to detect up to 10 ppm of SO2 gas, and the FET-type sensor shows significantly improved gas response by using the pre-bias scheme.
- Is Part Of:
- Solid-state electronics. Volume 165(2020)
- Journal:
- Solid-state electronics
- Issue:
- Volume 165(2020)
- Issue Display:
- Volume 165, Issue 2020 (2020)
- Year:
- 2020
- Volume:
- 165
- Issue:
- 2020
- Issue Sort Value:
- 2020-0165-2020-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-03
- Subjects:
- FET-type gas sensor -- Resistor-type gas sensor -- Tungsten trioxide (WO3) -- Sulfur dioxide (SO2) -- ID drift -- Pre-bias
Semiconductors -- Periodicals
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00381101 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.sse.2019.107747 ↗
- Languages:
- English
- ISSNs:
- 0038-1101
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8327.385000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 14577.xml