Cite
MLA Citation
Moon Hwan Cha et al.. “Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma.” Vacuum, vol. 181, 2020, p. . http://access.bl.uk/ark:/81055/vdc_100112671691.0x000051
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Moon Hwan Cha et al.. “Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma.” Vacuum, vol. 181, 2020, p. . http://access.bl.uk/ark:/81055/vdc_100112671691.0x000051