Effect of zinc oxide addition in slag system and heating manner on boron removal from metallurgical grade silicon. (January 2017)
- Record Type:
- Journal Article
- Title:
- Effect of zinc oxide addition in slag system and heating manner on boron removal from metallurgical grade silicon. (January 2017)
- Main Title:
- Effect of zinc oxide addition in slag system and heating manner on boron removal from metallurgical grade silicon
- Authors:
- Wu, Jijun
Xia, Zhenfei
Ma, Wenhui
Wang, Fanmao
Zhou, Yeqiang
Wei, Kuixian - Abstract:
- Abstract: Different amount of ZnO was added to calcium silicate reagent to improve boron removal from metallurgical grade silicon (MG-Si). The thermodynamic analysis showed that the reagent CaO-SiO2 -ZnO had a stronger ability to boron removal than the reagent CaO-SiO2 . Two kinds of heating manners of electromagnetic induction and resistance were used to refine MG-Si. Compared with the resistance heating, the induction heating showed a much higher efficiency of boron removal. The mechanism of boron removal from MG-Si by ternary CaO-SiO2 -ZnO slag reagent was put forward and the role of ZnO in slag to boron removal was described. The by-product Zn in refined silicon can be thoroughly removed by a vacuum distillation treatment, which showed an absolute advantage to the residual zinc removal in silicon by comparison with the acid leaching treatment. The residual zinc in silicon was reduced to lower than 0.05 ppmw after a vacuum treatment at 1723 K.
- Is Part Of:
- Materials science in semiconductor processing. Volume 57(2016)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 57(2016)
- Issue Display:
- Volume 57, Issue 2016 (2016)
- Year:
- 2016
- Volume:
- 57
- Issue:
- 2016
- Issue Sort Value:
- 2016-0057-2016-0000
- Page Start:
- 59
- Page End:
- 62
- Publication Date:
- 2017-01
- Subjects:
- Metallurgical grade silicon -- Slag reagent -- Boron removal -- Removal efficiency -- Vacuum distillation
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2016.10.001 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 14487.xml