Cite
APA Citation
Hur, J., Tasneem, N., Choe, G., Wang, P., Wang, Z., Khan, A. I., & Yu, S. (2020). direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition. Nanotechnology, 31, . http://access.bl.uk/ark:/81055/vdc_100111734004.0x000043