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HARVARD Citation
Hur, J. et al. (2020). Direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition. Nanotechnology. p. . [Online].
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Hur, J. et al. (2020). Direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition. Nanotechnology. p. . [Online].