Cite
MLA Citation
Harrison Sejoon Kim et al.. “High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor.” Journal of materials chemistry, vol. 8, no. 37, 2020, pp. 13033–13039. http://access.bl.uk/ark:/81055/vdc_100111676084.0x00000c