Impact of heterogeneous gate dielectric on DC, RF and circuit-level performance of source-pocket engineered Ge/Si heterojunction vertical TFET. (9th September 2020)
- Record Type:
- Journal Article
- Title:
- Impact of heterogeneous gate dielectric on DC, RF and circuit-level performance of source-pocket engineered Ge/Si heterojunction vertical TFET. (9th September 2020)
- Main Title:
- Impact of heterogeneous gate dielectric on DC, RF and circuit-level performance of source-pocket engineered Ge/Si heterojunction vertical TFET
- Authors:
- Tripathy, Manas Ranjan
Singh, Ashish Kumar
Samad, A
Singh, Prince Kumar
Baral, Kamalaksha
Jit, Satyabrata - Abstract:
- Abstract: This paper reports the DC, RF and circuit-level performance analysis of short-channel Ge/Si based source-pocket engineered (SPE) vertical heterojunction tunnel field effect transistors (Ge/Si SPE-V-HTFETs) with and without a heterogeneous gate dielectric (HGD) structure for the first time. The DC performance parameters in terms of ION /IOFF and subthreshold swing (SS) are investigated for the proposed V-HTFETs. The average SS for the proposed V-HTFET with an HGD is found to be as low as 20 mV dec −1 compared to V-HTFET without any HGD (26 mV dec −1 ) at VDS = 0.5 V. The proposed Ge/Si SPE-V-HTFET with an HGD possesses higher cut-off frequency of 502 GHz and maximum frequency of oscillation of 2.33 THz at VDS = 0.5 V over the Ge/Si SPE-V-HTFET without any HGD which possesses cut-off frequency of 273 GHz and maximum frequency of oscillation of 1.47 THz. The proposed Ge/Si SPE-V-HTFET with and without an HGD have then been used for designing a basic current mirror circuit. Device-level study has been carried out using SILVACO ATLAS TM TCAD simulator while the circuit-level investigation has been performed using the look up table based Verilog-A models in the CADENCE Virtuoso tool. The performances of the Ge/Si SPE-V-HTFET with HGD based current mirror circuit is observed to be better than the corresponding current mirror circuit designed by Ge/Si SPE-V-HTFET without any HGD.
- Is Part Of:
- Semiconductor science and technology. Volume 35:Number 10(2020)
- Journal:
- Semiconductor science and technology
- Issue:
- Volume 35:Number 10(2020)
- Issue Display:
- Volume 35, Issue 10 (2020)
- Year:
- 2020
- Volume:
- 35
- Issue:
- 10
- Issue Sort Value:
- 2020-0035-0010-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-09-09
- Subjects:
- tunnel field effect transistor -- heterojunction -- subthreshold swing -- source pocket -- heterogeneous gate dielectric -- current mirror
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/0268-1242/1 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6641/aba418 ↗
- Languages:
- English
- ISSNs:
- 0268-1242
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
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- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 14310.xml