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APA Citation
Liu, Y., Booth, J., & Chabert, P. (n.d.). effect of frequency on the uniformity of symmetrical RF CCP discharges. Plasma sources science & technology, 27, . http://access.bl.uk/ark:/81055/vdc_100108534127.0x000052
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Liu, Y., Booth, J., & Chabert, P. (n.d.). effect of frequency on the uniformity of symmetrical RF CCP discharges. Plasma sources science & technology, 27, . http://access.bl.uk/ark:/81055/vdc_100108534127.0x000052