Cite
HARVARD Citation
Simoen, E. et al. (2019). Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?. Semiconductor science and technology. p. . [Online].
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Simoen, E. et al. (2019). Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?. Semiconductor science and technology. p. . [Online].