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APA Citation
Tu, C., Lin, K., Pu, J., Chung, T., Hsiao, C., Huang, A., Yang, J., Takenobu, T., & Chen, C. (2020). cVD growth of large-area InS atomic layers and device applications. Nanoscale, 12(17), 9366–9374. http://access.bl.uk/ark:/81055/vdc_100106605025.0x000033