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APA Citation
Abrenica, G. H. A., Lebedev, M. V., Fingerle, M., Arnauts, S., Bazzazian, N., Calvet, W., Porret, C., Bender, H., Mayer, T., de Gendt, S., & van Dorp, D. H. (2020). atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis. Journal of materials chemistry, 8(29), 10060–10070. http://access.bl.uk/ark:/81055/vdc_100106472420.0x00001e