Unveiling the pinning behavior of charged domain walls in BiFeO3 thin films via vacancy defects. (March 2020)
- Record Type:
- Journal Article
- Title:
- Unveiling the pinning behavior of charged domain walls in BiFeO3 thin films via vacancy defects. (March 2020)
- Main Title:
- Unveiling the pinning behavior of charged domain walls in BiFeO3 thin films via vacancy defects
- Authors:
- Geng, W.R.
Tian, X.H.
Jiang, Y.X.
Zhu, Y.L.
Tang, Y.L.
Wang, Y.J.
Zou, M.J.
Feng, Y.P.
Wu, B.
Hu, W.T.
Ma, X.L. - Abstract:
- Abstract: Manipulation of electronic states in functional ferroelectrics is promising for next generation electronics devices. The charged domain walls in ferroelectric materials especially facilitate the electronic state modulation and are promising for developing interface-based devices. However, the major challenges impeding the application are their intentional manipulation and the elusive pinning behavior. Here, results that charged domain walls in BiFeO3 films can be pinned and regulated by oxygen vacancy planar distributions controlled by oxygen pressure during film growth are reported. Using aberration-corrected scanning transmission electron microscopy complemented by theoretical simulations, rich pinning behavior of tail-to-tail charged domain walls by oxygen vacancy plates is revealed. At high annealing oxygen pressure, 71° charged domain walls are stabilized by narrow vacancy plates. Decreasing the oxygen pressure, the transformation from 71° to 109° charged domain walls happens by expanding the vacancy plates, as collaborated by phase field simulations. Besides, the 71°-109° charged domain wall pairs are stabilized due to further interaction between two neighboring vacancy plates. These results provide the active modulation of the electronic states and illuminate the rich pinning behavior of domain walls by vacancy defects in ferroelectrics, which in turn could provide implications for designing potential electronics devices. Graphical Abstract: Image, graphicalAbstract: Manipulation of electronic states in functional ferroelectrics is promising for next generation electronics devices. The charged domain walls in ferroelectric materials especially facilitate the electronic state modulation and are promising for developing interface-based devices. However, the major challenges impeding the application are their intentional manipulation and the elusive pinning behavior. Here, results that charged domain walls in BiFeO3 films can be pinned and regulated by oxygen vacancy planar distributions controlled by oxygen pressure during film growth are reported. Using aberration-corrected scanning transmission electron microscopy complemented by theoretical simulations, rich pinning behavior of tail-to-tail charged domain walls by oxygen vacancy plates is revealed. At high annealing oxygen pressure, 71° charged domain walls are stabilized by narrow vacancy plates. Decreasing the oxygen pressure, the transformation from 71° to 109° charged domain walls happens by expanding the vacancy plates, as collaborated by phase field simulations. Besides, the 71°-109° charged domain wall pairs are stabilized due to further interaction between two neighboring vacancy plates. These results provide the active modulation of the electronic states and illuminate the rich pinning behavior of domain walls by vacancy defects in ferroelectrics, which in turn could provide implications for designing potential electronics devices. Graphical Abstract: Image, graphical abstract … (more)
- Is Part Of:
- Acta materialia. Volume 186(2020)
- Journal:
- Acta materialia
- Issue:
- Volume 186(2020)
- Issue Display:
- Volume 186, Issue 2020 (2020)
- Year:
- 2020
- Volume:
- 186
- Issue:
- 2020
- Issue Sort Value:
- 2020-0186-2020-0000
- Page Start:
- 68
- Page End:
- 76
- Publication Date:
- 2020-03
- Subjects:
- BiFeO3 films -- Oxygen vacancy plates -- Charged domain wall pinning -- Aberration-corrected scanning transmission electron microscopies -- Phase field simulations
Materials -- Periodicals
Materials science -- Periodicals
Materials -- Mechanical properties -- Periodicals
Metallurgy -- Periodicals
Chemistry, Inorganic -- Periodicals
620.112 - Journal URLs:
- http://www.sciencedirect.com/science/journal/13596454 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.actamat.2019.12.041 ↗
- Languages:
- English
- ISSNs:
- 1359-6454
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0629.920000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 13500.xml