Aqueous-solution-driven HfGdOx gate dielectrics for low-voltage-operated α-InGaZnO transistors and inverter circuits. (1st August 2020)
- Record Type:
- Journal Article
- Title:
- Aqueous-solution-driven HfGdOx gate dielectrics for low-voltage-operated α-InGaZnO transistors and inverter circuits. (1st August 2020)
- Main Title:
- Aqueous-solution-driven HfGdOx gate dielectrics for low-voltage-operated α-InGaZnO transistors and inverter circuits
- Authors:
- Zhang, Yongchun
He, Gang
Wang, Wenhao
Yang, Bing
Zhang, Chong
Xia, Yufeng - Abstract:
- Abstract: In this work, a non-toxic and environmentally friendly aqueous-solution-based method has been adopted to prepare gadolinium-doped hafnium oxide (HfO2 ) gate dielectric thin films. By adjusting the gadolinium (Gd) doping concentration, the oxygen vacancy content, band offset, interface trap density, and dielectric constant of HfGdO x (HGO) thin films have been optimized. Results have confirmed that HGO thin films with Gd doping ratio of 15 at.% have demonstrated appropriate dielectric constant of 27.1 and lower leakage current density of 5.8 × 10 −9 A cm -2 . Amorphous indium-gallium-zinc oxide (α-IGZO) thin film transistors (TFTs) based on HGO thin film (Gd: 15 at.%) as gate dielectric layer have exhibited excellent electrical performance, such as larger saturated carrier mobility ( μ sat ) of 20.1 cm 2 V -1 S -1, high on/off current ratio ( I on / I off ) of ∼10 8, smaller sub-threshold swing (SS) of 0.07 V decade -1, and a negligible threshold voltage shift (△ V TH ) of 0.08 V under positive bias stress (PBS) for 7200 s. To confirm its potential application in logic circuit, a resistor-loaded inverter based on HGO/α-IGZO TFTs has been constructed. A high voltage gain of 19.8 and stable full swing characteristics have been detected. As a result, it can be concluded that aqueous-solution-driven HGO dielectrics have potential application in high resolution flat panel displays and ultra-large-scale integrated logic circuits.
- Is Part Of:
- Journal of materials science & technology. Volume 50(2020)
- Journal:
- Journal of materials science & technology
- Issue:
- Volume 50(2020)
- Issue Display:
- Volume 50, Issue 2020 (2020)
- Year:
- 2020
- Volume:
- 50
- Issue:
- 2020
- Issue Sort Value:
- 2020-0050-2020-0000
- Page Start:
- 1
- Page End:
- 12
- Publication Date:
- 2020-08-01
- Subjects:
- Aqueous-solution-driven -- Low-voltage-operating -- HfGdOx gate dielectrics -- Rare earth element doping -- α-IGZO TFTs
Metals -- Periodicals
Materials science -- Periodicals
Materials science
Metals
Periodicals
620.1105 - Journal URLs:
- http://www.jmst.org/EN/volumn/home.shtml ↗
http://www.sciencedirect.com/science/journal/10050302 ↗
http://www.sciencedirect.com/ ↗ - DOI:
- 10.1016/j.jmst.2020.03.007 ↗
- Languages:
- English
- ISSNs:
- 1005-0302
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 13399.xml