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APA Citation
Vinod Kumar, K., Arun, N., Mangababu, A., Ojha, S., Nageswara Rao, S. V. S., & Pathak, A. P. (2020). 120 MeV Ag ion irradiation induced intermixing, grain fragmentation in HfO2/GaOx thin films and consequent effects on the electrical properties of HfO2/GaOx/Si-based MOS capacitors. Radiation effects and defects in solids, 175(1), 150–159. http://access.bl.uk/ark:/81055/vdc_100101889535.0x00001c