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HARVARD Citation
Vinod Kumar, K. et al. (2020). 120 MeV Ag ion irradiation induced intermixing, grain fragmentation in HfO2/GaOx thin films and consequent effects on the electrical properties of HfO2/GaOx/Si-based MOS capacitors. Radiation effects and defects in solids. 175 (1), pp. 150-159. [Online].