Cite
MLA Citation
Jierui Liang et al.. “Impact of Post‐Lithography Polymer Residue on the Electrical Characteristics of MoS2 and WSe2 Field Effect Transistors.” Advanced materials interfaces, vol. 6, no. 3, 2019, p. n/a. http://access.bl.uk/ark:/81055/vdc_100077467778.0x00000c