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MLA Citation
Changyong Oh et al.. “Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films.” Nanotechnology, vol. 30, 2019, p. . http://access.bl.uk/ark:/81055/vdc_100094365792.0x000055
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Changyong Oh et al.. “Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films.” Nanotechnology, vol. 30, 2019, p. . http://access.bl.uk/ark:/81055/vdc_100094365792.0x000055