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HARVARD Citation
Oh, C. et al. (2019). Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films. Nanotechnology. p. . [Online].
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Oh, C. et al. (2019). Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films. Nanotechnology. p. . [Online].