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APA Citation
Wu, K., Gao, M., Du, H., Chen, D., Zhao, L., & Ma, Z. (2020). improvement of the performance of ITO/a-SiOx/n-Si device by controllable sputtering power and reducible interface states. Materials science in semiconductor processing, 105, . http://access.bl.uk/ark:/81055/vdc_100093290012.0x000014