Cite
APA Citation
Wu, L., Yu, B., Fan, Z., Zhang, P., Feng, C., Chen, P., Ji, J., & Qian, L. (2020). effects of normal load and etching time on current evolution of scratched GaAs surface during selective etching. Materials science in semiconductor processing, 105, . http://access.bl.uk/ark:/81055/vdc_100093289360.0x000013