Structural and morphological study of thermally oxidized titanium thin films for the detection of chlorpyrifos. (January 2020)
- Record Type:
- Journal Article
- Title:
- Structural and morphological study of thermally oxidized titanium thin films for the detection of chlorpyrifos. (January 2020)
- Main Title:
- Structural and morphological study of thermally oxidized titanium thin films for the detection of chlorpyrifos
- Authors:
- Ghosh, S.P.
Pattnaik, S.
Pradhan, D.
Das, K.C.
N.Tripathy,
Bose, G.
Kar, J.P. - Abstract:
- Abstract: In this research work, titanium oxide (TiO2 ) thin films were grown on p-type (100) silicon substrate by thermal oxidation of RF sputtered titanium thin films in air ambient at various temperatures ranging from 500 °C to 950 °C. The XRD pattern revealed the evolution of a mixture of anatase and rutile phases at thermal oxidation temperature of 500 °C. At higher temperature (>500 °C), well oriented crystalline rutile phase was obtained for all the thermally oxidized TiO2 films. The average crystallite size of the oxidized films at 500 °C and 950 °C is estimated as 9 nm and 43 nm, respectively. The root mean square (RMS) surface roughness is found to be increased with the rise in oxidation temperature. The microstructural studies by Raman spectroscopy have also revealed a mixture of anatase and rutile peak at 500 °C. The morphological studies have revealed the enhancement in grain size with the increase in oxidation temperature with the appearance of distinct grain boundaries. The chlorpyrifos sensing behavior of the oxidized samples were carried out at room temperature. Chlorpyrifos is a neurotoxic organophosphate compound, which is most widely used as a pesticide in agricultural farm. Current-time (I-t) measurement of thermally oxidized Ti films was performed in order to detect the chlorpyrifos. A significant enhancement in the conductivity was observed with the introduction of chlorpyrifos vapors. From the current-time curve, the response and recovery time duringAbstract: In this research work, titanium oxide (TiO2 ) thin films were grown on p-type (100) silicon substrate by thermal oxidation of RF sputtered titanium thin films in air ambient at various temperatures ranging from 500 °C to 950 °C. The XRD pattern revealed the evolution of a mixture of anatase and rutile phases at thermal oxidation temperature of 500 °C. At higher temperature (>500 °C), well oriented crystalline rutile phase was obtained for all the thermally oxidized TiO2 films. The average crystallite size of the oxidized films at 500 °C and 950 °C is estimated as 9 nm and 43 nm, respectively. The root mean square (RMS) surface roughness is found to be increased with the rise in oxidation temperature. The microstructural studies by Raman spectroscopy have also revealed a mixture of anatase and rutile peak at 500 °C. The morphological studies have revealed the enhancement in grain size with the increase in oxidation temperature with the appearance of distinct grain boundaries. The chlorpyrifos sensing behavior of the oxidized samples were carried out at room temperature. Chlorpyrifos is a neurotoxic organophosphate compound, which is most widely used as a pesticide in agricultural farm. Current-time (I-t) measurement of thermally oxidized Ti films was performed in order to detect the chlorpyrifos. A significant enhancement in the conductivity was observed with the introduction of chlorpyrifos vapors. From the current-time curve, the response and recovery time during chlorpyrifos sensing was evaluated to be around ~43 s and ~3.9 s, respectively. … (more)
- Is Part Of:
- Materials science in semiconductor processing. Volume 105(2020)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 105(2020)
- Issue Display:
- Volume 105, Issue 2020 (2020)
- Year:
- 2020
- Volume:
- 105
- Issue:
- 2020
- Issue Sort Value:
- 2020-0105-2020-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-01
- Subjects:
- Thermal oxidation -- Sputtering -- Titanium oxide -- Chlorpyrifos detection
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2019.104695 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
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- Legaldeposit
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