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APA Citation
Pham, A., Klose, F., & Li, S. (2019). robust topological nodal lines in halide carbides. Physical chemistry chemical physics, 21(36), 20262–20268. http://access.bl.uk/ark:/81055/vdc_100092204096.0x000052
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Pham, A., Klose, F., & Li, S. (2019). robust topological nodal lines in halide carbides. Physical chemistry chemical physics, 21(36), 20262–20268. http://access.bl.uk/ark:/81055/vdc_100092204096.0x000052