Cite
HARVARD Citation
Pham, A. et al. (2019). Robust topological nodal lines in halide carbides. Physical chemistry chemical physics. 21 (36), pp. 20262-20268. [Online].
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Pham, A. et al. (2019). Robust topological nodal lines in halide carbides. Physical chemistry chemical physics. 21 (36), pp. 20262-20268. [Online].